Nhanganyaya Uye Nyore Kunzwisisa KweVacuum Coating (3)

Sputtering Coating Kana zvimedu zvine simba guru zvichibhomba nzvimbo yakasimba, zvimedu zviri panzvimbo yakasimba zvinogona kuwana simba uye zvinopukunyuka pamusoro kuti zviiswe pane substrate.Sputtering phenomenon yakatanga kushandiswa mukugadzira tekinoroji muna 1870, uye zvishoma nezvishoma yakashandiswa mukugadzirwa kwemaindasitiri mushure me1930 nekuda kwekuwedzera kwehuwandu hwekuisa.Iyo inowanzo shandiswa-mapango maviri sputtering mudziyo inoratidzwa muFigure 3 [Schematic dhayagiramu maviri vacuum coating pole sputtering].Kazhinji zvinhu zvichaiswa zvinogadzirwa muplate-chinangwa, chinogadziriswa pane cathode.Iyo substrate inoiswa pane anode yakatarisana neinotariswa nzvimbo, masendimita mashoma kubva pane iyo chinangwa.Mushure mekunge sisitimu yapombwa kune yakakwira vacuum, inozadzwa ne10 ~ 1 Pa gasi (kazhinji argon), uye voltage yezviuru zvakati volts inoshandiswa pakati pecathode neanode, uye kubuda kunopenya kunogadzirwa pakati pema electrode maviri. .Ioni yakanaka inogadzirwa nekubuda inobhururuka ichienda kune cathode pasi pechiito chemunda wemagetsi uye inodhumhana nemaatomu panzvimbo yakatariswa.Maatomu anonangwa anobuda panzvimbo yaakananga nekuda kwekudhumhana anonzi maatomu ekurutsa, uye simba rawo riri muchikamu che1 kusvika kumakumi emagetsi emagetsi.Maatomu akapwanyika anoiswa pamusoro pe substrate kuita firimu.Kusiyana nekuputira evaporation, sputter coating haina kuganhurirwa nekunyunguduka kweiyo firimu zvinhu, uye inogona sputter refractory zvinhu zvakaita seW, Ta, C, Mo, WC, TiC, etc. Iyo sputtering compound film inogona kuputirwa neiyo reactive sputtering. nzira, kureva, iyo reactive gasi (O, N, HS, CH, nezvimwewo) ndeye

yakawedzerwa kuAr gas, uye gasi rinoita basa nemaioni aro rinosangana neatomu yakanangwa kana atomu yakapfapfaidza kuita komboni (senge oxide, nitrogen) Compounds, zvichingodaro) yoiswa pasubstrate.Iyo yakakwirira-frequency sputtering nzira inogona kushandiswa kuisa iyo insulating firimu.Iyo substrate yakaiswa pane yakadzika electrode, uye iyo insulating target inoiswa pane yakatarisana electrode.Imwe mugumo we-high-frequency magetsi inogadziriswa, uye imwe mugumo inobatanidzwa kune electrode yakashongedzerwa nechinangwa chekudzivirira kuburikidza netiweki inoenderana uye DC inovhara capacitor.Mushure mekuchinja pane yakakwira-frequency magetsi, iyo yakakwira-frequency voltage inoramba ichichinja polarity yayo.Maerekitironi nemaoni akanaka muplasma anorova chinodzivirira chinangwa panguva yakanaka yehafu yekutenderera uye yakaipa hafu yekutenderera kwevoltage, zvichiteerana.Sezvo kufamba kwe electron kwakakwirira kudarika iyo yeoni yakanaka, pamusoro pechinangwa chekudzivirira chinopomerwa zvakashata.Kana iyo dynamic equilibrium yasvikwa, chinongedzo chiri padanho rakashata rekurerekera, kuitira kuti iyooni yakanaka inoputika pachinangwa inoenderera.Iko kushandiswa kwemagnetron sputtering kunogona kuwedzera deposition rate neinoda kurongeka kwehukuru kana ichienzaniswa neiyo isiri-magnetron sputtering.


Nguva yekutumira: Jul-31-2021